Precision optical components demand exceptional surface quality, nanometer-level roughness, and flawless geometry. Our high-purity Silicon Carbide (SiC) abrasives are engineered specifically for polishing and finishing optical glass, crystal substrates, IR windows, and sapphire elements.
With tightly controlled particle size distribution, low metallic contamination, and tailored friability, our SiC products offer reliable performance for manufacturers of advanced photonic and imaging systems.
F800–F1200 SiC ensures ultra-smooth surface generation with sub-nanometer Ra, ideal for spherical and aspherical lenses made of glass or sapphire.
Specialized SiC formulations enable precision lapping and polishing of ZnSe, ZnS, Ge, and other IR window materials with minimal sub-surface damage.
High-purity SiC abrasives are used to prepare YAG, LiNbO₃, and quartz substrates for optical coatings and waveguide fabrication.
F400–F600 SiC grains deliver chip-free edge finishing of lenses and filters prior to coating or dicing.
SiC helps achieve uniform thickness and minimal warpage for multi-layer filter substrates in laser and imaging optics.
SiC abrasives are used for pre-coating texturing of optics to improve thin film adhesion and durability.
| Grade | SiC Purity | Grit Range | Free Carbon | Applications |
|---|---|---|---|---|
| OptiPolish-S | 99.9% | F800–F1200 | < 0.03% | Final polish of optical lenses and windows |
| CrystalLap-X | 99.85% | F600–F1000 | < 0.05% | Flat lapping of crystal substrates |
| EdgeFinish-Pro | 99.5% | F400–F600 | < 0.08% | Edge finishing of optical parts |
Minimized oversized particle content ensures smooth, defect-free surfaces ready for anti-reflection or mirror coatings.
Higher material removal rate compared to ceria-based systems shortens process time without sacrificing accuracy.
Reduced slurry usage and lower reject rates contribute to significant operational savings for high-volume optics production.
| Metric | Ceria | Alumina | Sanhui SiC |
|---|---|---|---|
| Surface Roughness (Ra, nm) | 2.5–3.5 | 1.8–2.5 | 0.6–1.0 |
| Removal Rate (μm/min) | 0.4–0.6 | 0.6–0.9 | 1.0–1.3 |
| Contamination Risk | Moderate | Moderate | Low |
| Slurry Stability | Low | Medium | High |
Client: European optical component manufacturer
Challenge: Achieve sub-nanometer surface finish on sapphire optics used in thermal imaging systems
Solution: Implementation of Sanhui OptiPolish-S SiC with precision slurry dilution and pressure adjustment
While cerium oxide remains a common abrasive for softer optical glass, silicon carbide excels in polishing harder substrates such as sapphire, quartz, and infrared window materials. SiC provides faster material removal, tighter particle control, and superior scratch resistance, especially in applications where chemical reactivity is less important than mechanical finish. In many optical workflows, SiC significantly reduces cycle time and slurry costs without compromising surface integrity.
Each lot of our optical-grade SiC is subjected to a rigorous quality assurance protocol: (1) Incoming raw material purity verified by XRF and ICP-MS; (2) Particle size control confirmed using dynamic light scattering and SEM; (3) Oversize particles removed via air classification; (4) Batch-level statistical process control to monitor d50, PSD, and sphericity; (5) Final product tested on optical-grade glass and sapphire coupons; (6) Full Certificate of Analysis (COA) with every shipment, documenting 10+ key parameters including trace metal levels, carbon content, and shape index. This ensures reliable, repeatable performance for demanding optical finishing operations.
Yes. Our SiC abrasives are ideal for pre- and post-coating polishing of filters, beamsplitters, and high-reflectivity optics. The controlled friability and ultra-low metallic contamination make them suitable for AR, HR, and dielectric coatings where adhesion and optical clarity are critical. Our OptiPolish-S grade has been validated by multiple customers in EUV lithography, laser optics, and military optics industries for these applications.
Our SiC abrasives are engineered to integrate seamlessly with most standard polishing pads, carrier fluids, and equipment. They are compatible with polyurethane pads, flocked cloth pads, and composite pads used in high-precision polishing tools. Our technical team can assist with process tuning, including slurry dilution ratios, polishing pressures, and conditioning cycles to optimize your existing setup for SiC-based workflows.
Let our optical finishing specialists assist you in selecting the best SiC abrasives for your application. Contact us now for technical support or to request product samples.
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